Kenichiro Mizohata

Person

Latest publications

  1. Atomic Layer Deposition of Nickel Nitride Thin Films using NiCl2(TMPDA) and Tert‐Butylhydrazine as Precursors

    Väyrynen, K. M., Hatanpää, T. T., Mattinen, M. J., Heikkilä, M. J., Mizohata, K., Räisänen, J. A., Link, J., Stern, R., Ritala, M. K. & Leskelä, M. A., 1 Apr 2019, In : Physica Status Solidi. A: Applications and Materials Science. p. 1900058

    Research output: Contribution to journalArticleScientificpeer-review

  2. Deposition of impurity metals during campaigns with the JET ITER-like Wall

    Widdowson, A., Coad, J. P., Alves, E., Baron-Wiechec, A., Catarino, N., Corregidor, V., Heinola, K., Krat, S., Makepeace, C., Matthews, G. F., Mayer, M., Mizohata, K. & Sertoli, M., 6 Mar 2019, In : Nuclear materials and energy. 19, p. 218-224 7 p.

    Research output: Contribution to journalArticleScientificpeer-review

  3. Comparative study on the use of novel heteroleptic cyclopentadienyl-based zirconium precursors with H2O and O-3 for atomic layer deposition of ZrO2

    Seppälä, S., Vehkamäki, M., Mizohata, K., Noh, W., Räisänen, J., Ritala, M. & Leskelä, M., Mar 2019, In : Journal of vacuum science & technology : an official journal of the American Vacuum Society. 37, 2, 8 p., 020912.

    Research output: Contribution to journalArticleScientificpeer-review

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